Semi Announces Recipient of 2006 Semi Award for North America
July 10, 2006
2006 SEMI Award for North America Bestowed on Dr. Igor Khandros for Contributions to Semiconductor Test
SAN JOSE, Calif. – July 10, 2006 – SEMI today announced that the 2006 SEMI Award for North America will be presented to Dr. Igor Khandros, CEO of FormFactor for his innovations in parallel testing, microspring contactors and wafer probe cards. The industry honor will be presented at the Standards and Technology Reception, on the evening of Tuesday, July 11, 2006 during SEMICON West.
“The technical innovations developed by Dr. Khandros have helped reshape and redefine our industry’s approach to test,” said Stanley T. Myers, president and CEO of SEMI. “On behalf of SEMI, I would like to congratulate Dr. Khandros, and also express the sincere appreciation of both SEMI and the industry as a whole for his innovative contributions and dedication to the advancement of semiconductor manufacturing.”
2006 SEMI Award for North America:
Dr. Khandros founded FormFactor in 1993, and continues to serve as its chief executive officer and director. Since founding FormFactor, he has taken the company from a private start-up to a publicly- traded entity with industry-leading revenue growth rates. His vision for semiconductor testing continues to drive technological innovation while ensuring a strong bottom line.
Dr. Khandros’ pioneering work in test is responsible for lowering test costs through “parallelism,” which is the testing of multiple die simultaneously; increasing yield through the development of the microspring, a very robust, low-force contactor with excellent electrical performance characteristics resulting in superior test yields and high uptimes; and enabling roadmaps, which have led the way toward meeting customer requirements for tighter pad pitch, high pad density and lower power.
Prior to founding FormFactor, Dr. Khandros served as vice president of Development at Tessera, which he co-founded. Dr. Khandros holds an M.S. degree in metallurgical engineering from Kiev Polytechnic Institute in Kiev, Russia, and a Ph.D. in metallurgy from Stevens Institute of Technology in New Jersey.
The SEMI Award for North America is the highest honor conferred by SEMI, and has been presented annually since 1979 to honor individuals who have made significant technical contributions to the semiconductor industry. Nominations are accepted from individuals of North American-based member companies of SEMI. Past award recipients include Walter Benzing and Mike McNealy (1979) for epitaxial silicon deposition; Kenneth Levy (1983) for automated photomask inspection; Jean Hoerni (1985) for the planar process; Dan Maydan, Sass Somekh and David Wang (1988) for plasma etch; and Bruce Deal (1998) for silicon oxidation.
SEMI is a global industry association serving companies that provide equipment, materials and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS) and related technologies. SEMI maintains offices in Austin, Beijing, Brussels, Hsinchu, Moscow, San Jose (Calif.), Seoul, Shanghai, Singapore, Tokyo and Washington, D.C. For more information, visit www.semi.org.