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Cascade PMC200 Cryogenic Probe Station
  • Cascade PMC200 Cryogenic Probe Station
  • 200 mm Cryogenic Manual Probe Station - Probes Inside the Chamber
  • Front Loading Capability for Vacuum / Cryogenic Probing
  • Different Microscope Options for Vacuum/Cryogenic Probing

Advanced manual cryogenic wafer probing < 7 K

The PMC200 is a highly-precise, advanced manual probe system for wafers and substrates up to 200 mm in a high vacuum environment, at cryogenic temperatures down to 77 K with liquid nitrogen or < 7 K with liquid helium. Designed for educational and industrial environments, it supports a wide range of applications, including DC and RF measurements of the latest silicon, compound semiconductor and superconductor devices, MEMS and optoelectronic tests.

200 mm Cryogenic Manual Probe Station - Probes Inside the Chamber

Flexibility

  • Different substrate carriers for wafers up to 200 mm or single dies
  • Probe cards and/or up to eight positioners
  • Use with liquid nitrogen or helium, depending on the target temperature
  • Accessories available, such as black bodies and optical motion analysis tools
  • Designed for industrial environments
  • Covers wide range of measurements (I-V, C-V, RF, MEMS, OPTO)

Ice- and Condensation-Free Probing Below 7K for Cryogenic Tests

Stability

  • Independently cooled cold shield
  • Probe positioners placed inside vacuum chamber
  • Short and stable probe arms
  • Solid station frame with built-in vibration-isolation
  • Optional microscope bridge
  • Optional upgrade for 300 mm wafer
  • Ice- and condensation-free probing down to 77 K (liquid nitrogen) or below 7 K (liquid helium)
  • Precise probe positioning
  • Excellent measurement accuracy and repeatability
  • Superior vibration attenuation
  • Stable image quality for high-resolution microscopes

Front Loading Capability for Vacuum / Cryogenic Probing

Ease of Use

  • Intuitive, manual drives
  • Front loading capability through load door
  • Comfortable and easy operation
  • Quick and ergonomic change of DUT

 

High Measurement Throughput for Vacuum / Cryogenic Probing

High measurement throughput

  • Independent control of linear chuck stage and positioners
  • Contact/separation stroke for chuck
  • Fast, manual step-and-repeat testing of the whole wafer
  • Simultaneous contacting and separation of all probes

  • IV/CV
  • MEMS
  • Opto
  • RF/mmW/THz