Contact Us

Webinar Registration

Webinar Registration

使用下一代Guarded, True Kelvin MEMS 直流探针進行準確、一致的晶圓測量

Gate length down-scaling of silicon-based transistor results in very small on-state drain-source resistance, making it challenging for test engineers to perform precise and repeatable wafer measurements. Size reduction of aluminum-capped copper test pads to save on lithography, prototyping and production costs implies that it is very difficult to re-probe the same device with low contact resistance. Novel true-Kelvin MEMS analytical DC probes, new test and modelling strategies are proposed in this work to address these emerging test challenges.

Stay Informed

By clicking [Submit], you are providing FormFactor with your personal data. Personal data is used in accordance with FormFactor's Privacy Policy.